1;Cover;1 2;Title Page;5 3;Copyright;6 4;Contents;7 5;List of Contributors;15 6;Chapter 1 Pulsed Laser Deposition for Complex Oxide Thin Film and Nanostructure;19 6.1;1.1 Introduction;19 6.2;1.2 Pulsed Laser Deposition System Setup;20 6.3;1.3 Advantages and Disadvantages of Pulsed Laser Deposition;21 6.4;1.4 The Thermodynamics and Kinetics of Pulsed Laser Deposition;21 6.4.1;1.4.1 Laser-Material Interactions;22 6.4.2;1.4.2 Dynamics of the Plasma;23 6.4.3;1.4.3 Nucleation and Growth of the Film on the Substrate Surface;23 6.5;1.5 Monitoring of Growth Kinetics;26 6.5.1;1.5.1 Introduction and RHEED Studies;26 6.5.2;1.5.2 Growth Kinetics Studies by Surface X-ray Diffraction;27 6.6;1.6 Fundamental Parameters in Thin Film Growth;28 6.6.1;1.6.1 Substrate Temperature;28 6.6.2;1.6.2 Background Gas Pressure;28 6.6.3;1.6.3 Laser Fluence and Ablation Area;29 6.6.4;1.6.4 Target-Substrate Distance;29 6.6.5;1.6.5 Post-Annealing;30 6.6.6;1.6.6 Lattice Misfit;30 6.7;1.7 Pulsed Laser Deposition for Complex Oxide Thin Film Growth;31 6.7.1;1.7.1 Pulsed Laser Deposition for Superconductor Thin Film;32 6.7.2;1.7.2 Pulsed Laser Deposition for Ferroelectric Thin Films;32 6.7.3;1.7.3 Pulsed Laser Deposition for Ferromagnetic Thin Film;33 6.7.4;1.7.4 Pulsed Laser Deposition for Multiferroics Thin Film;33 6.7.5;1.7.5 Interface Strain Engineering the Complex Oxide Thin Film;34 6.7.5.1;1.7.5.1 Thickness Effect;34 6.7.5.2;1.7.5.2 Substrate Effect;35 6.7.5.3;1.7.5.3 Post-Annealing;39 6.8;1.8 Pulsed Laser Deposition for Nanostructure Growth;41 6.8.1;1.8.1 Self-Assembled Nanoscale Structures;41 6.8.2;1.8.2 Geometrically Ordered Arrays;41 6.9;1.9 Variation of Pulsed Laser Deposition;42 6.10;1.10 Conclusion;42 6.11;References;43 7;Chapter 2 Electron Beam Evaporation Deposition;51 7.1;2.1 Introduction;51 7.2;2.2 Electron Beam Evaporation System;53 7.2.1;2.2.1 Heating Principle and Characters of Electron Beams;53 7.2.1.1;2.2.1.1 Heating Principle of Electron Beams;53 7.2.1.2;2.2.1.2 Characters of Electron Beams;54 7.2.2;2.2.2 Equipments of Electron Beam Source;55 7.2.2.1;2.2.2.1 Filament and Electron Emission;55 7.2.2.2;2.2.2.2 Electron Beam Control;56 7.2.2.3;2.2.2.3 Power Supply, Crucibles, and Feed Systems;57 7.2.2.4;2.2.2.4 Source Materials;58 7.2.3;2.2.3 Application of Electron Beam Evaporation;61 7.2.3.1;2.2.3.1 Cooling of Electron Beam Gun;61 7.2.3.2;2.2.3.2 Evaporation of Source Materials by Electron Beam;61 7.2.3.3;2.2.3.3 Vacuum Deposition Process of Electron Beam Evaporation;62 7.2.3.4;2.2.3.4 Attention and Warning for Electron Beam Evaporation;63 7.3;2.3 Characterization of Thin Film;63 7.3.1;2.3.1 Surface Morphology by AFM;64 7.3.2;2.3.2 Thickness Measurement by Spectroscopic Ellipsometry;65 7.4;2.4 Summary;71 7.5;Acknowledgments;71 7.6;References;71 8;Chapter 3 Nanostructures and Thin Films Deposited with Sputtering;77 8.1;3.1 Introduction;77 8.2;3.2 Nanostructures with Sputtering;78 8.2.1;3.2.1 Oxide Nanostructures;79 8.2.1.1;3.2.1.1 Needle-Shaped MoO3 Nanowires;79 8.2.1.2;3.2.1.2 Bi2O3 Nanowires;82 8.2.2;3.2.2 Nitride Nanostructures;83 8.2.2.1;3.2.2.1 Graphitic-C3N4 Nanocone Array;83 8.2.2.2;3.2.2.2 InAlN Nanorods;86 8.3;3.3 Thin Films Deposited with Sputtering;89 8.3.1;3.3.1 Metal Alloy Thin Films;91 8.3.1.1;3.3.1.1 LaNi5 Alloy Thin Films;91 8.3.1.2;3.3.1.2 Ni-Mn-In Alloy Thin Films;92 8.3.2;3.3.2 Composite Metal Oxide Thin Films;93 8.3.2.1;3.3.2.1 BiFeO3/BaTiO3 Bilayer Thin Films;93 8.4;3.4 Summary;94 8.5;Acknowledgments;95 8.6;References;95 9;Chapter 4 Nanostructures and Quantum Dots Development with Molecular Beam Epitaxy;99 9.1;4.1 Introduction;99 9.2;4.2 Technology of MBE;100 9.2.1;4.2.1 The Physics of MBE;101 9.2.2;4.2.2 MBE Growth Mechanisms;104 9.2.2.1;4.2.2.1 Two-Dimensional (2D) MBE Growth Mechanism;105 9.2.2.2;4.2.2.2 Three-Dimensional (3D) MBE Growth Mechanism;106 9.2.2.3;4.2.2.3 Stranskie-Krastanow 3D Growth Mechanism;108 9.3;4.3 Nanoheterostructures Fabricated by Molecular Beam Epitaxy;109 9.3.1;4.3.1 Semiconducting Oxide Heterostru